Colloidal Silica For Semiconductor

Colloidal Silica For Semiconductor

High-Purity Semiconductor Candidate Grades
Particle Size: 10–20 nm
SiO₂ Content: 21–42% Depending on Grade
Published Metal Ions: <20 ppm or <50 ppm
Available pH Ranges: 2–4 or 7–9
Clean Packaging and Lot Control Available
Shelf Life: ≥12 Months

Shandong Peak-tech New Material Co., Ltd. is one of the most reliable manufacturers and suppliers of colloidal silica for semiconductor in China. With a professional production team, we are able to meet the needs of the majority of our customers. Welcome to buy durable colloidal silica for semiconductor for sale here from our factory.

 

Technical Data

Colloidal Silica for Semiconductor Grade Comparison

Model Particle Size SiO₂ Content Metal Ions pH Shelf Life
HP25D10 10–20 nm 25±1% <20 ppm 7–9 ≥12 months
HP3010 10–20 nm 30±1% <50 ppm 7–9 ≥12 months
HP2510A 10–20 nm 21–25% <50 ppm 2–4 ≥12 months
HP4010A 10–20 nm 38–42% <50 ppm 2–4 ≥12 months

Aluminum present as Al₂O₃ is excluded from the listed metal-ion total. HP25D10 and HP3010 are NH₄⁺-stabilized. Semiconductor qualification requires element-specific limits, clean handling and process-specific validation beyond the published total.

Semiconductor Material Control

Build the Specification Around Contamination Risk

<20 ppm

Lowest Published Metal Total

HP25D10 provides the tightest aggregate metal-ion limit among the listed semiconductor candidates.

Element-Specific Limits

Set Element-Specific Limits

Specify sodium, iron, aluminum and other process-sensitive elements individually, with methods and detection limits.

10–20 nm

Control Distribution and Agglomerates

All four grades share a 10–20 nm range. Confirm PSD, oversized-particle limits, agglomerates and the measurement method.

pH 2–4 or 7–9

Match Stabilizer and pH

Select an acidic or near-neutral grade according to process chemistry, permitted ions and surrounding materials.

Specification Confirmation

Information Needed for Semiconductor Qualification

Semiconductor approval requires contamination, particle, packaging, lot-control and change-management criteria beyond the product-family table.

  • Elemental limits: provide maximum values for each controlled metal and the reporting basis.
  • Analytical methods: specify ICP-MS, ICP-OES or other required methods, detection limits and sample preparation.
  • Particle specification: define nominal size, distribution, agglomerate limit and metrology method.
  • Process chemistry: confirm application, SiO₂ content, pH, stabilizer, conductivity and permitted ionic species.
  • Lot and change control: state COA fields, sampling rules, retention samples, traceability and change-notification requirements.
  • Packaging: define container material, cleanliness, filtration, filling environment, trial quantity and destination.

Request Colloidal Silica for Semiconductor Qualification

Send the application, element limits, particle specification, analytical methods, packaging and lot-control requirements.

Request Qualification Support
Packaging and Storage

Protect Product Stability During Storage

Packaging Options

Available polyethylene packaging sizes are 25 kg, 250 kg and 1000 kg.

Storage Temperature

Store at 0–40°C and protect from freezing. Temperatures below 0°C can cause irreversible gelation.

Direct Sunlight

Avoid prolonged exposure to direct sunlight during storage and transportation.

Container Closure

Keep containers closed to limit water evaporation and precipitation of solid silica particles.

FAQ

Colloidal Silica for Semiconductor Questions

Which colloidal silica grades can be evaluated for semiconductor use?

The high-purity candidate grades are HP25D10, HP3010, HP2510A and HP4010A.

Which semiconductor candidate has the lowest published metal-ion total?

HP25D10 is listed below 20 ppm; the other published HP grades are listed below 50 ppm.

Is the published total metal-ion value sufficient for semiconductor qualification?

Not always. Buyers should define element-specific limits, analytical methods, detection limits and reporting basis.

What clean-packaging requirements should be defined?

Define container material, particle cleanliness, filtration, filling conditions, sealing, sampling and transport requirements.

What lot-control documents should semiconductor buyers request?

Define required COA fields, test methods, sampling rules, retention samples and change-notification expectations before qualification.

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Applications

Applications of Colloidal Silica for Semiconductor

HP grades can be evaluated for semiconductor-related materials and precision processes after element limits, particles, process chemistry, packaging and lot controls are agreed.

Semiconductor CMP

Evaluated as an abrasive dispersion where particle control, metal contamination and slurry chemistry are tightly specified.

Wafer and Substrate Polishing

Suitable candidates can be tested for compatible ceramic, glass and other precision electronic substrates.

Semiconductor Packaging Materials

High-purity grades may be assessed in compatible packaging-material formulations where trace metals and particles are controlled.

Precision Electronic Surfaces

Controlled nanosilica can be qualified for compatible precision-finishing and functional-material processes.

High-Purity Inorganic Coatings

Selected candidates may be evaluated in compatible inorganic coatings requiring controlled metals and particle specifications.

Custom Semiconductor Materials

Supports development requiring defined element limits, particle metrology, traceability, change control and clean packaging.