Shandong Peak-tech New Material Co., Ltd. is one of the most reliable manufacturers and suppliers of sapphire polishing slurry in China. With a professional production team, we are able to meet the needs of the majority of our customers. Welcome to buy durable sapphire polishing slurry for sale here from our factory.
Colloidal Silica Grades for Sapphire Polishing Slurry
Sapphire polishing slurry combines controlled silica particles with application-specific chemistry to finish hard single-crystal Al₂O₃ surfaces. Particle selection should reflect crystal orientation, substrate format, initial roughness, polishing stage, pad, pressure and target surface quality.
| Model | Particle Size | SiO₂ Content | Na₂O Content | pH | Shelf Life |
|---|---|---|---|---|---|
| LS30 | 30–40 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS50 | 50–60 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS80 | 80–90 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS100 | 100–110 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS120 | 110–120 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS150 | 140–160 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS180 | 170–190 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
The LS grades are abrasive candidates for sapphire polishing slurry development, not finished polishing compounds. Confirm particle distribution, oversized-particle limits and polishing performance through trials.
Match Particle Size to the Required Finish
LS30 and LS50
Finer LS options for polishing trials prioritizing surface finish and lower scratch risk under compatible slurry conditions.
LS80, LS100 and LS120
Intermediate particle ranges for balancing material-removal rate, surface roughness and defect control.
LS150 and LS180
Larger candidates for trials requiring higher removal action, subject to strict scratch and oversized-particle control.
pH 3–11
The pH can be reviewed within the published customizable range after the target value and tolerance are provided.
Information Needed for Sapphire Polishing
Connect the abrasive specification with sapphire orientation, polishing stage, equipment and required surface quality.
- Sapphire substrate: identify crystal orientation, wafer or component type, dimensions, initial roughness and prior processing.
- Polishing stage: specify stock removal, intermediate polishing, final polishing or another process step.
- Particle specification: provide nominal size, distribution, oversized-particle limit, agglomerate limit and test method.
- Slurry chemistry: state SiO₂ content, target pH, additives, dilution water and permitted sodium level.
- Performance targets: define removal rate, surface roughness, flatness, haze, scratches, pits, edge damage and defect limits.
- Order details: include equipment, pad, trial quantity, annual demand, packaging and destination country.
Request a Sapphire Polishing Trial Grade
Send the sapphire orientation, substrate format, polishing stage, target particle size, slurry chemistry, removal-rate and surface-quality requirements.
Request a Sapphire Slurry RecommendationProtect Product Stability During Storage
Packaging Options
Available polyethylene packaging sizes are 25 kg, 250 kg and 1000 kg.
Storage Temperature
Store at 0–40°C and protect from freezing. Temperatures below 0°C can cause irreversible gelation.
Direct Sunlight
Avoid prolonged exposure to direct sunlight during storage and transportation.
Container Closure
Keep containers closed to limit water evaporation and precipitation of solid silica particles.
Sapphire Polishing Slurry Questions
Which colloidal silica grades can be evaluated for sapphire polishing?
The standard grades are LS30, LS50, LS80, LS100, LS120, LS150 and LS180.
What particle-size range is available for polishing trials?
The published grade ranges start at 30–40 nm and extend to 170–190 nm.
Can the pH be customized?
Yes. The pH is listed as customizable within 3–11, subject to final specification confirmation.
Which polishing results should be validated?
Validate removal rate, surface roughness, flatness, haze, scratches, pits, defect density, slurry stability and lot-to-lot consistency.
How should sapphire polishing colloidal silica be stored?
Store it at 0–40°C, prevent freezing and direct sunlight, and keep the container closed.
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Sapphire Polishing Slurry Applications
LS grades can be evaluated as abrasive candidates in sapphire polishing slurries. Select the particle range by polishing stage and validate removal rate, surface quality, defects and slurry stability in the actual process.
Sapphire Wafer Polishing
Evaluated for sapphire wafers after crystal orientation, particle distribution, pH and defect targets are defined.
LED Sapphire Substrates
Candidate grades can be tested for LED substrate finishing with controlled roughness and defect requirements.
Sapphire Windows and Covers
Can be assessed for optical windows and protective covers with defined flatness, clarity and surface-defect limits.
Sapphire Optical Components
Can be evaluated for lenses, domes and other precision sapphire components after geometry and surface targets are defined.
Sapphire Edge Finishing
Selected particle ranges may be evaluated for edge and shape finishing under controlled slurry and pad conditions.
Custom Sapphire Slurries
Supports development requiring a defined LS grade, controlled oversized particles, selected additives and a target pH within 3–11.
