Shandong Peak-tech New Material Co., Ltd. is one of the most reliable manufacturers and suppliers of ceramic polishing slurry in China. With a professional production team, we are able to meet the needs of the majority of our customers. Welcome to buy durable ceramic polishing slurry for sale here from our factory.
Colloidal Silica Grades for Ceramic Polishing Slurry
Ceramic polishing slurry combines controlled silica particles with application-specific chemistry for precision finishing of alumina, zirconia, silicon nitride and other compatible technical ceramics. Selection should reflect ceramic composition, density, hardness, grain structure, initial roughness, polishing stage, pad and target finish.
| Model | Particle Size | SiO₂ Content | Na₂O Content | pH | Shelf Life |
|---|---|---|---|---|---|
| LS30 | 30–40 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS50 | 50–60 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS80 | 80–90 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS100 | 100–110 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS120 | 110–120 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS150 | 140–160 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
| LS180 | 170–190 nm | 30–50% | ≤0.4% | 9.5–10.5 | ≥12 months |
The LS grades are abrasive candidates for ceramic polishing slurry development, not finished polishing compounds. Confirm particle distribution, oversized-particle limits and polishing performance through trials.
Match Particle Size to the Required Finish
LS30 and LS50
Finer LS options for polishing trials prioritizing surface finish and lower scratch risk under compatible slurry conditions.
LS80, LS100 and LS120
Intermediate particle ranges for balancing material-removal rate, surface roughness and defect control.
LS150 and LS180
Larger candidates for trials requiring higher removal action, subject to strict scratch and oversized-particle control.
pH 3–11
The pH can be reviewed within the published customizable range after the target value and tolerance are provided.
Information Needed for Ceramic Polishing
Connect the abrasive specification with ceramic composition, microstructure, polishing stage, equipment and required surface quality.
- Ceramic substrate: identify composition, grade, density, hardness, grain structure, dimensions, initial roughness and prior processing.
- Polishing stage: specify stock removal, intermediate polishing, final polishing or another process step.
- Particle specification: provide nominal size, distribution, oversized-particle limit, agglomerate limit and test method.
- Slurry chemistry: state SiO₂ content, target pH, additives, dilution water and permitted sodium level.
- Performance targets: define removal rate, surface roughness, flatness, haze, scratches, pits, edge damage and defect limits.
- Order details: include equipment, pad, trial quantity, annual demand, packaging and destination country.
Request a Ceramic Polishing Trial Grade
Send the ceramic composition, grade, component format, polishing stage, target particle size, slurry chemistry, removal-rate and surface-quality requirements.
Request a Ceramic Slurry RecommendationProtect Product Stability During Storage
Packaging Options
Available polyethylene packaging sizes are 25 kg, 250 kg and 1000 kg.
Storage Temperature
Store at 0–40°C and protect from freezing. Temperatures below 0°C can cause irreversible gelation.
Direct Sunlight
Avoid prolonged exposure to direct sunlight during storage and transportation.
Container Closure
Keep containers closed to limit water evaporation and precipitation of solid silica particles.
Ceramic Polishing Slurry Questions
Which colloidal silica grades can be evaluated for ceramic polishing?
The standard grades are LS30, LS50, LS80, LS100, LS120, LS150 and LS180.
What particle-size range is available for polishing trials?
The published grade ranges start at 30–40 nm and extend to 170–190 nm.
Can the pH be customized?
Yes. The pH is listed as customizable within 3–11, subject to final specification confirmation.
Which polishing results should be validated?
Validate removal rate, surface roughness, flatness, haze, scratches, pits, defect density, slurry stability and lot-to-lot consistency.
How should ceramic polishing colloidal silica be stored?
Store it at 0–40°C, prevent freezing and direct sunlight, and keep the container closed.
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Ceramic Polishing Slurry Applications
LS grades can be evaluated as abrasive candidates in ceramic polishing slurries. Select the particle range by polishing stage and validate removal rate, surface quality, defects and slurry stability in the actual process.
Alumina Ceramic Polishing
Evaluated for alumina substrates and components after grade, density, particle distribution and defect targets are defined.
Zirconia Ceramic Polishing
Candidate grades can be tested for zirconia components requiring controlled roughness, gloss and defect performance.
Silicon Nitride Components
Can be assessed for compatible silicon nitride components with defined flatness and surface-integrity limits.
Technical Ceramic Seals
Can be evaluated for seal faces and wear components after geometry, flatness and finish targets are defined.
Ceramic Wafer and Substrate Finishing
Selected particle ranges may be evaluated for ceramic wafers and substrates under controlled slurry and pad conditions.
Custom Ceramic Slurries
Supports development requiring a defined LS grade, controlled oversized particles, selected additives and a target pH within 3–11.
