Polishing slurries rely on the synergistic effect of mechanical grinding (abrasives) and chemical corrosion/hydration softening (additives). The system is divided into five main categories: Dispersion media, solid abrasives, functional organic additives, inorganic acids/bases/salts, and functional additives.
Component Categories | Common Materials | Core Functions
Dispersion Media (Substrate) | Deionized Water (Mainstream Water-Based), White Oil / Alkanes / Ethylene Glycol (Oil-Based) | Bears abrasive, transmits shear force, cools the workpiece, and washes away polishing debris
Solid Abrasive (Core Grinding Phase) | SiO₂ Silica Sol, Al₂O₃ Alumina, CeO₂ Cerium Oxide, Diamond Micron Powder, ZrO₂ Zirconia | Physical cutting to remove material; hardness and particle size determine polishing efficiency and surface roughness
pH Adjusters / Buffers | Alkaline: Ammonia, KOH, TEAH, Triethanolamine; Acidic: Phosphoric Acid, Nitric Acid, Acetic Acid, Citric Acid; Buffer Systems: Phosphates, Borates | Regulates the chemical reaction rate on the workpiece surface, maintains system stability, and prevents abrasive agglomeration
Organic Additives | Anionic / Nonionic Surfactants, Polyacrylate Dispersants, Polyethylene Glycol Lubricants, BTA / Thiol-Based Corrosion Inhibitors, Organosilicon Defoamers Disperses abrasive particles, reduces interfacial tension, lubricates and prevents scratches, inhibits metal over-corrosion, and eliminates foaming.
Special Functional Additives: Hydrogen peroxide/potassium permanganate (oxidant), organophosphorus complexing agent, preservative, suspension stabilizer. Oxidizes metal surfaces to form a soft oxide layer, chelates heavy metal impurities, and improves slurry storage stability.